Atomic structure and relaxation behavior at AlN (0001 )/Al 2O3 (0001) interface

Journal of the Ceramic Society of Japan

Volumn 114, Issue 1335, 2006, Pages 1018-1021

  Tokumoto, Yuki ^a   Mizoguchi, Teruyasu ^a   Sato, Yukio ^a   Shibata, Naoya ^a   Yamamoto, Takahisa ^a   Ikuhara, Yuichi ^a  

^a UNIVERSITY OF TOKYO   (Japan)

Author keywords

Aluminum nitride; Atomic structure; Interface; Static lattice calculation

Indexed keywords

ATOMS; CRYSTAL ATOMIC STRUCTURE; CRYSTAL LATTICES; HIGH RESOLUTION ELECTRON MICROSCOPY; LATTICE CONSTANTS; TRANSMISSION ELECTRON MICROSCOPY;

ATOMIC RELAXATION; HIGH-RESOLUTION TRANSMISSION ELECTRON MICROSCOPY (HRTEM); STATIC LATTICE CALCULATIONS;

ALUMINUM COMPOUNDS;

EID: 33750727378     PISSN: 09145400     EISSN: 13486535     Source Type: Journal    
DOI: 10.2109/jcersj.114.1018     Document Type: Article

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