Atomic structure of AlN/Al2O3 interfaces fabricated by pulsed-laser deposition

Journal of Materials Science

Volumn 41, Issue 9, 2006, Pages 2553-2557

  Tokumoto, Y ^a   Sato, Y ^a   Yamamoto, T ^a   Shibata, N ^a   Ikuhara, Y ^a  

^a UNIVERSITY OF TOKYO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; CRYSTAL ATOMIC STRUCTURE; CRYSTAL ORIENTATION; INTERFACES (MATERIALS); PULSED LASER DEPOSITION; TRANSMISSION ELECTRON MICROSCOPY;

HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY (HRTEM); IMAGE SIMULATIONS; STRUCTURAL MODEL;

ALUMINUM NITRIDE;

EID: 33744745982     PISSN: 00222461     EISSN: 15734803     Source Type: Journal    
DOI: 10.1007/s10853-006-7767-1     Document Type: Conference Paper

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