Electronic structure and thermal stability of nitrided Hf silicate films using a direct N plasma

Applied Physics Letters

Volumn 89, Issue 18, 2006, Pages

  Cho, M H ^a   Chung, K B ^a   Moon, D W ^a  

^a Korea Research Institute of Standards and Science   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CHEMICAL BONDS; DISSOCIATION; ELECTRON ENERGY LEVELS; ELECTRONIC STRUCTURE; HAFNIUM COMPOUNDS; THERMODYNAMIC STABILITY;

COMPLEX CHEMICAL STATES; HF SILICATE FILMS; PLASMA TREATMENT; POSTNITRIDATION ANNEALING;

THIN FILMS;

EID: 33750709298     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2374852     Document Type: Article

References (10)

1. G. D. Wilk, R. M. Wallace, and J. M. Anthony, J. Appl. Phys. 87, 484 (2000).
2. G. Lucovsky and G. B. Raynor, Appl. Phys. Lett. 77, 2912 (2000).
3. H. Kim and P. C. McIntyre, J. Appl. Phys. 92, 5094 (2002).
4. M. R. Visokay, J. J. Chambers, A. L. P. Rotondaro, A. Shanware, and L. Colombo, Appl. Phys. Lett. 80, 3183 (2002).
5. M.-H. Cho, K. B. Chung, and D.-H. Ko, Appl. Phys. Lett. 89, 142902 (2006).
6. J. W. Kim, H. W. Yeom, K. J. Kong, B. D. Yu, D. Y. Ahn, Y. D. Chung, C. N. Whang, H. Yi, Y. H. Ha, and D. W. Moon, Phys. Rev. Lett. 90, 106101 (2003).
7. M. Takahashi, T. Mizokuro, Y. Nishioka, and H. Kobayashi, Surf. Sci. 518, 72 (2002).
8. C. S. Kang, H.-J. Cho, K. Onishi, R. Nieh, R. Choi, S. Gopalan, S. Krishnan, J. H. Han, and J. C. Lee, Appl. Phys. Lett. 81, 2593 (2002).
9. K. B. Chung, C. N. Whang, M.-H. Cho, C. J. Yim, and D.-H. Ko, Appl. Phys. Lett. 88, 081903 (2006).
10. M. L. Green, M.-Y. Ho, B. Busch, G. D. Wilk. T. Sorsch, T. Conard, B. Brijs, W. Vandervorst, P. I. Räisänen, D. Muller, M. Bude, and J. Grazul, J. Appl. Phys. 92, 7168 (2002).