Fabrication of nanophotonic structures by soft UV nanoimprint lithography

Nami Jishu yu Jingmi Gongcheng/Nanotechnology and Precision Engineering

Volumn 4, Issue 3, 2006, Pages 225-229

  Shi, J ^a,b   Wang, Z M ^a   Bao, K ^a   Peroz C ^c   Belotti, M ^c   Xu, L P ^a   Luo, C X ^a   Sun, M H ^a   Zhang, B ^a   Ji, H ^a   Ouyang, Q ^a   Chen, Y ^a,c  

^a PEKING UNIVERSITY   (China)

^b ECOLE NORMALE SUPÉRIEURE   (France)

^c CNRS   (France)

Author keywords

Nanofabrication; Nanoimprint; Nanophotonics

Indexed keywords

NANOFABRICATION; NANOIMPRINT LITHOGRAPHY; NANOPHOTONIC STRUCTURES; OPTICAL INTEGRATED CIRCUITS; PHOTOCURABLE POLYMER; POLYDIMETHYLSILOXANE (PDMS); SEMICONDUCTOR SUBSTRATES; SOFT TRANSPARENT MOLDS;

ETCHING; INTEGRATED CIRCUIT MANUFACTURE; INTEGRATED OPTOELECTRONICS; IONS; NANOTECHNOLOGY; PHOTOLITHOGRAPHY; SILICON WAFERS; SOLIDIFICATION; ULTRAVIOLET RADIATION;

LITHOGRAPHY;

EID: 33750589361     PISSN: 16726030     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (11)

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