Lithographically patterned nanowire electrodeposition

Nature Materials

Volumn 5, Issue 11, 2006, Pages 914-919

  Menke, E J ^a   Thompson, M A ^a   Xiang, C ^a   Yang, L C ^a   Penner, R M ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; NANOSTRUCTURED MATERIALS; NICKEL; PHOTOLITHOGRAPHY; SIGNAL PROCESSING;

ELECTROCHEMICAL SYNTHESIS; LITHOGRAPHICALLY PATTERNED NANOWIRE ELECTRODEPOSITION (LPNE); NANOELECTRONIC DEVICES; NANOWIRES;

ELECTRODEPOSITION;

EID: 33750471573     PISSN: 14761122     EISSN: 14764660     Source Type: Journal    
DOI: 10.1038/nmat1759     Document Type: Article

References (25)

1. Spicer, D. F., Rodger, A. C. & Varnell, G. L. Computer-controlled pattern generating system for use with electron-beam writing instruments. J. Vac. Sci. Technol. 10, 1052-1055 (1973).
2. Varnell, G. L., Spicer, D. F. & Rodger, A. C. E-Beam writing techniques for semiconductor-device fabrication. J. Vac. Sci. Technol. 10, 1048-1051 (1973).
3. Vieu, C. et al. Electron beam lithography: Resolution limits and applications. Appl Surf. Sci. 164, 111-117 (2000).
4. Berger, S. D. & Gibson, J. M. New approach to projection-electron lithography with demonstrated 0.1 μM linewidth. Appl. Phys. Lett. 57, 153-155 (1990).
5. Berger, S. D. et al. Projection electron-beam lithography - A new approach. J. Vac. Sci. Technol B 9, 2996-2999 (1991).
6. Liddle, J. A. et al. Space-charge effects in projection electron-beam lithography: Results from the SCALPEL proof-of-lithography system. J. Vac. Sci. Technol. B 19, 476-481 (2001).
7. Jorritsma, J., Gijs, M. A. M., Kerkhof, J. M. & Stienen, J. G. H. General technique for fabricating large arrays of nanowires. Nanotechnology 7, 263-265 (1996).
8. Natelson, D., Willett, R. L., West, K. W. & Pfeiffer, L. N. Fabrication of extremely narrow metal wires. Appl. Phys. Lett. 77, 1991-1993 (2000).
9. Natelson, D., Willett, R. L., West, K. W. & Pfeiffer, L. N. Geometry-dependent dephasing in small metallic wires. Phys. Rev. Lett. 86, 1821-1824 (2001).
10. Melosh, N. A. et al. Ultrahigh-density nanowire lattices and circuits. Science 300, 112-115 (2003).
11. Thompson, M. A., Menke, E. J., Martens, C. C. & Penner, R. M. Shrinking nanowires by kinetically controlled electrooxidation. J. Phys. Chem, B 110, 36-41 (2006).
12. Nagale, M. P. & Fritsch, I. Individually addressable, submicrometer band electrode arrays. 1. Fabrication from multilayered materials. Anal. Chem. 70, 2902-2907 (1998).
13. Bard, A. J. Electrochemical Methods: Fundamentals and Applications (Wiley, New York, 2001).
14. Walter, E. C. et al. Noble and coinage metal nanowires by electrochemical step edge decoration. J. Phys. Chem. B 106, 11407-11411 (2002).
15. Durkan, C. & Welland, M. E. Size effects in the electrical resistivity of polycrystalline nanowires. Phys. Rev. B 61, 14215-14218 (2000).
16. Marzi, G. D., Iacopino, D., Quinn, A. J. & Redmond, G. Probing intrinsic transport properties of single metal nanowires: Direct-write contact formation using a focused ion beam. J. Appl. Phys. 96, 3458-3462 (2004).
17. Yang, F. Y. et al. Large magnetoresistance of electrodeposited single-crystal bismuth thin films. Science 284, 1335-1337 (1999).
18. Yang, F. Y. et al. Large magnetoresistance and finite-size effect in electrodeposited bismuth lines. J. Appl. Phys. 89, 7206-7208 (2001).
19. Chiu, P. & Shih, I. A study of the size effect on the temperature-dependent resistivity of bismuth nanowires with rectangular cross-sections. Nanotechnology 15, 1489-1492 (2004).
20. Fuchs, K. The conductivity of thin metallic films according to the electron theory of metals. Proc. Camb. Phil. Soc. 34, 100-108 (1938).
21. Sondheimer, E. H. The mean free path of electrons in metals. Adv. Phys. 1, 1-42 (1952).
22. Mayadas, A. F. & Shatzkes, M. Electrical-resistivity model for polycrystalline films - case of arbitrary reflection at external surfaces. Phys. Rev. B 1, 1382-1389 (1970).
23. Stebhogl, W., Schindlet, G., Steinlesberger, G., Traving, M. & Engelhardt, M. Comprehensive study of the resistivity of copper wires with lateral dimensions of 100 nm and smaller. J. Appl Phys. 97, 023706 (2005).
24. Marom, H. & Eizenberg, M. The temperature dependence of resistivity in thin metal films. J. Appl. Phys. 96, 3319-3323 (2004).
25. Steinhogl, W., Schindler, G., Steinlesberger, G. & Engelhardt, M. Size-dependent resistivity of metallic wires in the mesoscopic range. Phys. Rev. B 66, 075414 (2002).