Noble and coinage metal nanowires by electrochemical step edge decoration

Journal of Physical Chemistry B

Volumn 106, Issue 44, 2002, Pages 11407-11411

  Walter, E C ^a   Murray, B J ^a   Favier, F ^b   Kaltenpoth, G ^c   Grunze, M ^c   Penner, R M ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b UNIVERSITY OF HEIDELBERG   (Germany)

^c CNRS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

NANOWIRES;

COINAGE; ELECTRIC POTENTIAL; ELECTRODEPOSITION; GRAPHITE; NUCLEATION; OXIDATION; PRECIOUS METALS;

NANOSTRUCTURED MATERIALS;

EID: 0037038557     PISSN: 10895647     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp026389p     Document Type: Article

References (41)

1. Foss, C.A.; Tierney, M.J.; Martin, C.R. J. Phys. Chem. 1992, 96, 9001.
2. Foss, C.A.; Hornyak, G.L.; Stockert, J.A.; Martin, C.R. J. Phys. Chem. 1994, 98, 2963.
3. Brumlik, C.J.; Martin, C.R. J. Am. Chem. Soc. 1991, 113, 3174.
4. Brumlik, C.J.; Menon, V.P.; Martin, C.R. J. Mater. Res. 1994, 9, 1174.
5. Cepak, V.M.; Martin, C.R. J. Phys. Chem. B 1998, 102, 9985.
6. Foss, C.A.; Tierney, M.J.; Martin, C.R. J. Phys. Chem. 1992, 96, 9001.
7. Hornyak, G.L.; Patrissi, C.J.; Martin, C.R. Nanostructured Mater. 1997, 9, 705.
8. Sapp, S.A.; Mitchell, D.T.; Martin, C.R. Chem. Mater. 1999, 11, 1183.
9. Searson, P.C.; Cammarata, R.C.; Chien, C.L. J. Electron. Mater. 1995, 24, 955.
10. Sun, L.; Searson, P.C.; Chien, C.L. Appl. Phys. Lett. 1999, 74, 2803.
11. Sun, L.; Searson, P.C.; Chien, C.L. Phys. Rev. B 2000, 61, R6463.
12. Whitney, T.M.; Jiang, J.S.; Searson, P.C.; Chien, C.L. Science 1993, 261, 1316.
13. Liu, K.; Chien, C.L.; Searson, P.C.; Kui, Y.Z. Appl. Phys. Lett. 1998, 73, 1436.
14. Martin, C.R. Adv. Mater. 1991, 3, 457.
15. Loiseau, A.; Pascard, H. Chem. Phys. Lett. 1996, 256, 246.
16. Sloan, J.; Wright, D.M.; Woo, H.G.; Bailey, S.; Brown, G.; York, A.P.E.; Coleman, K.S.; Hutchison, J.L.; Green, M.L.H. Chem. Commun. 1999, 699.
17. Terrones, M.; Hsu, W.K.; Schilder, A.; Terrones, H.; Grobert, N.; Hare, J.P.; Zhu, Y.Q.; Schwoerer, M.; Prassides, K.; Kroto, H.W.; Walton, D.R.M. Appl. Phys. A 1998, 66, 307.
18. Terrones, M.; Grobert, N.; Hsu, W.K.; Zhu, Y.Q.; Hu, W.B.; Terrones, H.; Hare, J.P.; Kroto, H.W.; Walton, D.R.M. MRS Bull. 1999, 24, 43.
19. Jana, N.R.; Gearheart, L.; Murphy, C. J. Chem. Commun. 2001, 617.
20. Jana, N.R.; Gearheart, L.; Murphy, C.J. J. Phys. Chem. B 2001, 105, 4065.
21. Jana, N.R.; Gearheart, L.; Murphy, C. J. Adv. Mater. 2001, 13, 1389.
22. Zhang, Y.; Franklin, N.W.; Chen, R.J.; Dai, H. J. Chem. Phys. Lett. 2000, 331, 35.
23. Peckerar, M.; Bass, R.; Rhee, K.W. J. Vac. Sci. Technol. B 2000, 18, 3143.
24. Vieu, C.; Carcenac, F.; Pepin, A.; Chen, Y.; Mejias, M.; Lebib, A.; Manin-Ferlazzo, L.; Couraud, L.; Launois, H. Appl. Surf. Sci. 2000, 164, 111.
25. Jung, T.; Schlittler, R.; Gimzewski, J.K.; Himpsel, F. J. Appl. Phys. A 1995, 61, 467.
26. Himpsel, F.J.; Jung, T.; Ortega, J.E. Surf. Rev. Lett. 1997, 4, 371.
27. Himpsel, F.J.; Jung, T.; Kirakosian, A.; Lin, J.L.; Petrovykh, D.Y.; Rauscher, H.; Viernow, J. MRS Bull. 1999, 24, 20.
28. Petrovykh, D.Y.; Himpsel, F.J.; Jung, T. Surf. Sci. 1998, 407, 189.
29. Zach, M.P.; Inazu, K.; Hemminger, J.C.; Penner, R.M. Chem. Mater. 2002, 14, 3206.
30. Zach, M.P.; Ng, K.H.; Penner, R.M. Science 2000, 290, 2120.
31. Morcos, I. J. Chem. Phys. 1972, 57, 1801.
32. Penner, R.M. J. Phys. Chem. B 2002, 106, 3339.
33. Noll, J.D.; Nichoison, M.A.; VanPatten, P.G.; Chung, C.W.; Myrick, M.L. J. Electrochem. Soc. 1998, 145, 3320.
34. Zangwill, A. Physics at Surfaces; Cambridge University Press: Cambridge, U.K., 1988.
35. Rice, R.J.; McCreery, R.L. Anal. Chem. 1989, 61, 1637.
36. Bowling, R.J.; McCreery, R.L.; Pharr, C.M.; Engstrom, R.C. Anal. Chem. 1989, 61, 2763.
37. Robinson, R.S.; Sternitzke, K.; McDermott, M.T.; McCreery, R.L. J. Electrochem. Soc. 1991, 138, 2412.
38. Bowling, R.J.; Packard, R.T.; McCreery, R.L. J. Am. Chem. Soc. 1989, 111, 1217.
39. Walter, E.C.; Favier, F.; Penner, R.M. Anal. Chem. 2002, 74, 1546.
40. Favier, F.; Walter, E.C.; Zach, M.P.; Benter, T.; Penner, R.M. Science 2001. 293, 2227.
41. The overpotential is the difference between the applied deposition potential and the reversible potential for the metal of interest.