Structural characterisation of ultra-thin VOx films on TiO2(1 1 0)

Surface Science

Volumn 600, Issue 21, 2006, Pages 4813-4824

  Kroger E A ^a   Allegretti, F ^b   Knight, M J ^b   Polcik, M ^a   Sayago, D I ^a   Woodruff, D P ^b   Dhanak, V R ^c  

^a FRITZ HABER INSTITUT DER MAX PLANCK GESELLSCHAFT   (Germany)

^b UNIVERSITY OF WARWICK   (United Kingdom)

^c DARESBURY LABORATORY   (United Kingdom)

Author keywords

Surface structure; Titanium oxide; Vanadium oxide; X ray standing waves

Indexed keywords

CHEMISORPTION; FILM GROWTH; MONOLAYERS; PHOTOEMISSION; SURFACE PHENOMENA; SURFACE STRUCTURE; TITANIUM OXIDES;

EVAPORATED FILMS; REACTIVE EVAPORATION; SUBSTRATE SURFACES; VANADIUM OXIDES; X-RAY STANDING WAVES;

ULTRATHIN FILMS;

EID: 33750436246     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2006.07.049     Document Type: Article

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