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Volumn 436, Issue 1, 1999, Pages 227-236

Ultrathin VOx/TiO2(110) (x ≈ 1) film preparation by controlled oxidation of metal deposits

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CHEMICAL VARIABLES CONTROL; EPITAXIAL GROWTH; FILM PREPARATION; OXIDATION; TEMPERATURE; THICKNESS MEASUREMENT; TITANIUM DIOXIDE; VANADIUM COMPOUNDS; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 0033365510     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(99)00666-4     Document Type: Article
Times cited : (34)

References (21)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.