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Volumn 436, Issue 1, 1999, Pages 227-236
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Ultrathin VOx/TiO2(110) (x ≈ 1) film preparation by controlled oxidation of metal deposits
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Author keywords
[No Author keywords available]
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Indexed keywords
ANNEALING;
CHEMICAL VARIABLES CONTROL;
EPITAXIAL GROWTH;
FILM PREPARATION;
OXIDATION;
TEMPERATURE;
THICKNESS MEASUREMENT;
TITANIUM DIOXIDE;
VANADIUM COMPOUNDS;
X RAY PHOTOELECTRON SPECTROSCOPY;
IN SITU STRUCTURAL CHARACTERIZATION;
PHOTOELECTRON DIFFRACTION;
VANADIUM OXIDES;
ULTRATHIN FILMS;
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EID: 0033365510
PISSN: 00396028
EISSN: None
Source Type: Journal
DOI: 10.1016/S0039-6028(99)00666-4 Document Type: Article |
Times cited : (34)
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References (21)
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