Photoelectron diffraction study on the structure of a vanadium ultrathin film deposited at the TiO2(110) surface

Surface Science

Volumn 349, Issue 3, 1996, Pages

  Sambi, Mauro ^a   Pin, Erica ^a   Sangiovanni, Guido ^a   Zaratin, Laura ^a   Granozzi, Gaetano ^a   Parmigiani, Fulvio ^b  

^a UNIVERSITY OF PADOVA   (Italy)

^b POLITECNICO DI MILANO   (Italy)

Author keywords

Epitaxy; Growth; Low index single crystal surfaces; Metal insulator interfaces; Metal oxide semiconductor (MOS) structures; Photoelectron diffraction; Single crystal epitaxy; Surface structure, morphology, roughness, and topography; Titanium; Titanium oxid

Indexed keywords

ELECTRON BEAMS; EPITAXIAL GROWTH; EVAPORATION; MONOLAYERS; MORPHOLOGY; MOS DEVICES; SINGLE CRYSTALS; SURFACE ROUGHNESS; TITANIUM DIOXIDE; ULTRATHIN FILMS; VANADIUM; X RAY DIFFRACTION;

ELECTRON BEAM EVAPORATION; PHOTOELECTRON DIFFRACTION; TOPOGRAPHY; X RAY PHOTOELECTRON DIFFRACTION;

SURFACE STRUCTURE;

EID: 0030129946     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/0039-6028(95)01339-3     Document Type: Article

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