|
Volumn 470, Issue 1-2, 2000, Pages
|
The structure of vanadia ultrathin films grown on TiO2 (110) in an oxygen ambient
|
Author keywords
Photoelectron diffraction; Single crystal epitaxy; Surface structure, morphology, roughness, and topography; Titanium oxide; Vanadium oxide
|
Indexed keywords
DEPOSITION;
ELECTRON BEAMS;
ELECTRONIC STRUCTURE;
EPITAXIAL GROWTH;
EVAPORATION;
FILM GROWTH;
MORPHOLOGY;
OXYGEN;
SINGLE CRYSTALS;
SURFACE ROUGHNESS;
TITANIUM DIOXIDE;
ULTRATHIN FILMS;
PHOTOELECTRON DIFFRACTION;
VANADIA;
VANADIUM COMPOUNDS;
|
EID: 0034514261
PISSN: 00396028
EISSN: None
Source Type: Journal
DOI: 10.1016/S0039-6028(00)00856-6 Document Type: Article |
Times cited : (24)
|
References (19)
|