Microstructure and properties of indium tin oxide thin films deposited by RF-magnetron sputtering

Rare Metals

Volumn 25, Issue 4, 2006, Pages 359-364

  Li, Shitao ^a   Qiao, Xueliang ^a   Chen, Jianguo ^a   Jia, Fang ^a   Wu, Changle ^a  

^a HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

Author keywords

Indium tin oxide (ITO); IR irradiation temperature; Microstructure; Photoelectrolytic properties; Refractive index; RF magnetron sputtering

Indexed keywords

CERAMIC MATERIALS; CRYSTALLINE MATERIALS; DETERIORATION; ENERGY GAP; INDIUM COMPOUNDS; MAGNETRON SPUTTERING; MICROSTRUCTURE; OXYGEN; PLASMA WAVES; REFRACTIVE INDEX; SURFACE ROUGHNESS; TIN COMPOUNDS; X RAY PHOTOELECTRON SPECTROSCOPY;

INDIUM-TIN OXIDE (ITO); IR IRRADIATION TEMPERATURE; PHOTOELECTROLYTIC PROPERTIES; RF-MAGNETRON SPUTTERING;

THIN FILMS;

EID: 33750409810     PISSN: 10010521     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1001-0521(06)60068-5     Document Type: Article

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