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Thin Solid Films

Volumn 398, Issue 399, 2001, Pages 397-404

Microstructure of superhard (Ti, Al)N/Mo multilayers

(7) Tavares, C J a Rebouta, L a Riviere J P b Pacaud, J b Garem, H b Pischow, K c Wang, Z c

a UNIVERSITY OF MINHO (Portugal)

b UNIVERSITÉ DE POITIERS (France)

c Savcor Group Ltd Oy (Finland)

Author keywords

High resolution transmission electron microscopy; Multilayers; Roughness; Stress; Superhard coatings; X Ray diffraction

Indexed keywords

GRAIN SIZE AND SHAPE; MAGNETRON SPUTTERING; MICROSTRUCTURE; NANOSTRUCTURED MATERIALS; STRESSES; SURFACE ROUGHNESS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

SELECTED AREA DIFFRACTION (SAD);

MULTILAYERS;

EID: 0035507104 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(01)01349-9 Document Type: Article

Times cited : (14)

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