Real-time monitoring of silicon oxide deposition processes

Surface and Coatings Technology

Volumn 180-181, Issue , 2004, Pages 655-658

  Gravalidis, C ^a   Gioti, M ^a   Laskarakis, A ^a   Logothetidis, S ^a  

^a ARISTOTLE UNIVERSITY OF THESSALONIKI   (Greece)

Author keywords

In situ; Optical properties; Real time; Silicon oxide; Spectroscopic ellipsometry

Indexed keywords

DEPOSITION; ELLIPSOMETRY; EVAPORATION; GROWTH KINETICS; MONITORING; STOICHIOMETRY;

GROWTH MECHANISMS; TAUC-LORENTZ MODEL;

SILICON COMPOUNDS;

COATING;

EID: 1842681747     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2003.10.141     Document Type: Article

References (13)

1. Bogart K.H.A. Dalleska N.F. Collins G.R. Diamond Relat. Mater. 10 2001 1304
2. I. Pinter, M. Adam, C.S. Dusco, N.Q. Khanh, I. Barsony, Proceedings of the Tenth International Colloquium on Plasma Processes, 1995, p. 410
3. Awazu K. Onuki H. J. Non-Cryst. Solids 38 1997 998
4. Kapetanakis E. Normand P. Tsoukalas D. Appl. Phys. Lett. 77 2000 3450
5. Boer E. Brongersna M.L. Atwater H.A. Appl. Phys. Lett. 79 2001 791
6. Zahorski D. Mariani J.L. Escadafals L. Gilles J. Thin Solid Films 234 1993 412
7. Gallas B. Fisson S. Brunet-Bruneau A. Vuye G. Rivory J. Thin Solid Films 377-378 2000 62-67
8. S. Logothetidis, A. Laskarakis, A. Gika, P. Patsalas 151-152 (2002) 204
9. Jelison G.E. Modine F.A. Appl. Phys. Lett. 69 1996 371
10. Wang L.-S. Desai S.R. Wu H. Nichloas J.B. Z. Phys. D 40 1997 36-39
11. Palik E.D. Handbook of Optical Constants of Solids II 1991 Academic Boston
12. Herzinger C.M. Johs B. McGahan W.A. Woollam J.A. Paulson W. J. Appl. Phys. 83 1998 3323
13. T.G. Krug, Proceeding of the 41st Society of Vacuum coaters annual conference, SVC (1990) 163