High NA and low residual aberration projection lens for DUV scanner

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4691, Issue 1, 2002, Pages 687-695

  Matsuyama, Tomoyuki ^a   Shibazaki, Yuichi ^a   Ohmura, Yasuhiro ^a   Suzuki, Takeshi ^a  

^a Precision Equipment Company   (Japan)

Author keywords

ArF projection lens; Intrinsic birefringence of CAF2; Lens mounting

Indexed keywords

ABERRATIONS; BIREFRINGENCE; DEFORMATION; IMAGING SYSTEMS; MOUNTINGS; OPTICAL DESIGN; PROJECTION SYSTEMS; SCANNING;

LENS MOUNTING; PROJECTION LENSES;

OPTICAL INSTRUMENT LENSES;

EID: 0036415503     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.474617     Document Type: Article

References (3)

1. J.H. Burnett, et al. "Intrinsic birefringence in 157 nm materials" the 157nm symposium, 2000.
2. nd ed., pp. 232-238 (Addison-Wesley, Reading, Mass. 1990).
3. nd ed., pp. 489-494 (McGraw-Hill, New York, New York 1990).