Nikon projection lens update

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5377, Issue PART 2, 2004, Pages 730-741

  Matsuyama, Tomoyuki ^a   Ishiyama, Toshiro ^a   Ohmura, Yasuhiro ^a  

^a NIKON CORPORATION   (Japan)

Author keywords

Aberration; ArF projection lens; Flare; High NA; Linear polarized illumination; Low k1 lithography

Indexed keywords

DESIGN; FOCUSING; IMAGING SYSTEMS; LIGHT POLARIZATION; LITHOGRAPHY; OPTICAL DESIGN; PARAMETER ESTIMATION;

ABBERATION; FLARE; LINEAR POLARIZED ILLUMINATION; PROJECTION LENSES;

LENSES;

EID: 3843146040     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.537206     Document Type: Conference Paper

References (10)

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3. K. Matsumoto, et al., "Current Topics of Lithography Optics", ODF2002 Technical Digest AP022144 FS01 ODG, 2002
4. T. Matsuyama, et al., "High NA and low residual aberration projection lens for DUV scanner", SPIE Vol. 4691, 2002.
5. T. Matsuyama, et al., "Improving lens performance through the most recent lens manufacturing process", SPIE Vol. 5040, 2003.
6. F. Zernike: Physica, 1 (1934), 689.
7. T. Matsuyama, "Aberration Functions for Microlithographic Optics", ODF2002 Technical Digest AP022144 FS01 ODG, 2002
8. T. Matsuyama, "Aberration Functions for Microlithographic Optics", OPTICAL REVIEW(OSJ) Vol. 10, No4, 2003
9. T. Matsuyama, "Aberration Functions for Microlithographic Optics", OPTICS DESIGN(ODG) AP032211, 2003
10. Y. Shimizu, et al, "Aberration Optimizing System Using Zernike Sensitivity Method", SPIE Vol. 5040, 2003