Raman scattering from nanopatterned silicon surface prepared by low-energy Ar+-ion irradiation

Physica E: Low-Dimensional Systems and Nanostructures

Volumn 35, Issue 1, 2006, Pages 42-47

  Mohanta, S K ^a   Soni, R K ^a   Tripathy, S ^b   Soh, C B ^b   Chua, S J ^b   Kanjilal, D ^c  

^a INDIAN INSTITUTE OF TECHNOLOGY DELHI   (India)

^b INSTITUTE OF MATERIALS RESEARCH AND ENGINEERING   (Singapore)

^c INTER UNIVERSITY ACCELERATOR CENTRE   (India)

Author keywords

Low energy ion irradiation effect; Nanostructured silicon; Raman scattering

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTALLINE MATERIALS; PHONONS; RAMAN SCATTERING; RAPID THERMAL ANNEALING; SEMICONDUCTING SILICON;

ION-BEAM ENERGY; LOW-ENERGY ION-IRRADIATION EFFECT; NANODOTS; NANOSTRUCTURED SILICON;

NANOSTRUCTURED MATERIALS;

EID: 33748926275     PISSN: 13869477     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.physe.2006.05.007     Document Type: Article

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