Transport and magnetotransport properties of Co thin films on Si

Journal of Magnetism and Magnetic Materials

Volumn 226-230, Issue PART II, 2001, Pages 1631-1632

  Pakhomov, A B ^a,b   Denardin, J C ^a   De Lima, O F ^a   Knobel, M ^a   Missell, F P ^c  

^a UNIVERSITY OF CAMPINAS   (Brazil)

^b HONG KONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Hong Kong)

^c UNIVERSITY OF SÃO PAULO   (Brazil)

Author keywords

Hall effect; Magnetoresistance thin films; Resistance

Indexed keywords

COBALT; HALL EFFECT; MAGNETORESISTANCE; METAL INSULATOR BOUNDARIES; SEMICONDUCTOR INSULATOR BOUNDARIES; THIN FILMS;

CO THIN FILMS; COBALT FILM; MAGNETIC-FIELD; MAGNETO TRANSPORT PROPERTIES; MAGNETORESISTANCE THIN FILM; METALLIC COBALT; RESISTANCE; SILICON SUBSTRATES; TEMPERATURE RANGE; VARYING THICKNESS;

METAL INSULATOR TRANSITION;

EID: 33748686358     PISSN: 03048853     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0304-8853(00)01044-1     Document Type: Article

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