Photoemission study of monolayer Co on Si(111) surface

Applied Surface Science

Volumn 152, Issue 1, 1999, Pages 44-48

  Kim, Bongsoo ^a   Kim, K J ^a   Kang, T H ^a  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; COBALT; ELECTRONIC STRUCTURE; INTERFACES (MATERIALS); MOLECULAR BEAM EPITAXY; MONOLAYERS; PHOTOEMISSION; SEMICONDUCTOR METAL BOUNDARIES; THERMAL EFFECTS;

COBALT SILICIDE;

SEMICONDUCTING SILICON;

EID: 0033321236     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(99)00297-4     Document Type: Article

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