Effect of surface roughness on magnetization reversal of Co films on plasma-etched Si(100) substrates

Journal of Applied Physics

Volumn 83, Issue 11, 1998, Pages 6287-6289

  Li, M ^a   Zhao, Y P ^a   Wang, G C ^a   Min, H G ^b  

^a Research Rensselaer Polytechnic Institute   (United States)

^b Hong Ik University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001562341     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.367718     Document Type: Article

References (10)

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