Growth evolution of Sr-silicide layers on Si(111) and Mg2Si/Si(111) substrates

Thin Solid Films

Volumn 508, Issue 1-2, 2006, Pages 74-77

  Miura, Kentaro ^a   Ohishi, Takuya ^a   Inaba, Takashi ^a   Mizuyoshi, Yusuke ^a   Takagi, Noriyuki ^a   Matsuyama, Takashi ^b   Momose, Yoshimi ^a   Koyama, Tadanobu ^a   Hayakawa, Yasuhiro ^a   Tatsuoka, Hirokazu ^a  

^a SHIZUOKA UNIVERSITY   (Japan)

^b Pulstec Industrial Co Ltd   (Japan)

Author keywords

Diffusion; Interfaces; Silicides; Structural properties

Indexed keywords

DEPOSITION; DIFFUSION; INTERFACES (MATERIALS); SILICON; STRONTIUM COMPOUNDS; SUBSTRATES;

MULTIPLE PHASE GROWTH; SILICIDES; STRUCTURAL PROPERTIES;

GROWTH KINETICS;

EID: 33748657825     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.06.110     Document Type: Article

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