Growth of Ca2Si layers on Mg2Si/Si(1 1 1) substrates

Journal of Crystal Growth

Volumn 237-239, Issue 1-4 III, 2002, Pages 2121-2124

  Matsui, H ^a   Kuramoto, M ^a   Ono, T ^a   Nose, Y ^a   Tatsuoka, H ^a   Kuwabara, H ^a  

^a SHIZUOKA UNIVERSITY   (Japan)

Author keywords

A1. Diffusion; A1. Interfaces; A1. Surface processes; B2. Semiconducting silicon compounds

Indexed keywords

FREE ENERGY; HEAT TREATMENT; INTERDIFFUSION (SOLIDS); INTERFACES (MATERIALS); MAGNESIUM COMPOUNDS; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; SURFACE PHENOMENA; TRANSMISSION ELECTRON MICROSCOPY; VAPOR PHASE EPITAXY; X RAY DIFFRACTION ANALYSIS;

SINGLE PHASE LAYERS;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 0036530634     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(01)02276-X     Document Type: Article

References (16)