Density inhomogeneity in ferroelectric thin films

Applied Physics Letters

Volumn 89, Issue 5, 2006, Pages

  Cao, Jiang Li ^a   Solbach, Axel ^a   Klemradt, Uwe ^a   Weirich, Thomas ^a   Mayer, Joachim ^a   Böttger, Ulrich ^a   Schorn, Peter J ^a   Waser, Rainer ^a  

^a RWTH AACHEN UNIVERSITY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

DENSITY (SPECIFIC GRAVITY); DEPOSITION; FERROELECTRICITY; LEAD ALLOYS; SYNCHROTRON RADIATION; TRANSMISSION ELECTRON MICROSCOPY;

DENSITY INHOMOGENEITY; GRAZING INCIDENCE; SUBLAYER STRUCTURE; X-RAY SPECULAR REFLECTIVITY;

FERROELECTRIC THIN FILMS;

EID: 33748461808     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2244045     Document Type: Article

References (24)

1. J. F. Scott and C. A. Paz de Araujo, Science 246, 1400 (1989).
2. O. Auciello, J. F. Scott, and R. Ramesh, Phys. Today 51(7), 22 (1998).
3. T. Zhao, F. Chen, H. Lu, G. Yang, and Z. Chen, J. Appl. Phys. 87, 7442 (2000).
4. S. H. Seo, H. C. Rang, D. Y. Noh, Y. Yamada, and K. Wasa, Appl. Phys. Lett. 84, 3133 (2004).
5. S. B. Krapanidhi, H. Hu, and V. Kumar, J. Appl. Phys. 71, 376 (1992).
6. V. agarajan, A. Roytburd, A. Stanishevsky, S. Prasertchoung, T. Zhao, L. Chen, J. Melngailis, O. Auciello, and R. Ramesh, Nat. Mater. 2, 43 (2003).
7. C. M. Foster, Z. Li, M. Buckett, D. Miller, P. M. Baldo, L. E. Rehn, G. R. Bai, D. Guo, H. You, and K. L. Merkle, J. Appl. Phys. 78, 2607 (1995).
8. R. Waser, T. Schneller, S. Hoffmann-Eiteit, and P. Ehrhart, Integr. Ferrolectr. 36, 3 (2001).
9. R. W. Schwaitz, T. Schneller, and R. Waser, C. R. Chim. 7, 433 (2004).
10. E. Chason and T. M. Mayer, Crit. Rev. Solid State Mater. Sci. 22, 1 (1997).
11. J. L. Cao, A. Solbach, U. Klemradt, T. Weirich, J. Mayer, U. Boettger, U. Ellerkmann, P. J. Schorn, P. Gerber, and R. Waser, J. Am. Ceram. Soc. 89, 1321 (2006).
12. J. L. Cao, A. Solbach, U. Klemradt, U. Boettger, U. Ellerkmann, P. J. Schorn, P. Gerber, and R. Waser (unpublished).
13. U. Ellerkmann, P. Schorn, D. Bolten, U. Boettger, R. Waser, R. Brachhaus, and K. Yamakawa, Integr. Ferroelectr. 52, 63 (2003).
14. N. Tohge, S. Takahashi, and T. Minami, J. Am. Ceram. Soc. 74, 67 (1991).
15. X. L. Li, B. Chen, H. Y. Jing, H. B. Lu, B. R. Zhao, Z. H. Mai, and Q. J. Jia, Appl. Phys. Lett. 87, 222905 (2005).
16. H. Kohlstedt, N. A. Pertsev, and R. Waser, Mater. Res. Soc. Symp. Proc. 688, C6.5.1 (2002).
17. D. D. Fong, G. B. Stephenson, S. K. Streiffer, J. A. Eastman, O. Auciello, P. H. Fuoss, and C. Thompson, Science 304, 1650 (2004).
18. R. Kretschmer and K. Binder, Phys. Rev. B 20, 1065 (1979).
19. P. K. Larsen, G. J. M. Dormans, D. J. Taylor, and P. J. van Veldhoven, J. Appl. Phys. 76, 2405 (1994).
20. A. K. Tagantsev, I. Stolichnov, E. L. Colla, and N. Setter, J. Appl. Phys. 90, 1387 (2001).
21. J. Junquera and P. Ghosez, Nature (London) 422, 506 (2003).
22. Z. Suo, Curr. Opin. Solid State Mater. Sci. 3, 486 (1998).
23. J. Robertson and C. W. Chen, Appl. Phys. Lett. 74, 1168 (1999).
24. M. Alexe, C. Harnagea, D. Hesse, and U. Goesele, Appl. Phys. Lett. 79, 242 (2001).