Measurement of biaxial stress states in silicon using micro-raman spectroscopy

Journal of Applied Mechanics, Transactions ASME

Volumn 73, Issue 5, 2006, Pages 745-751

  Gustafson, Peter A ^a   Harris, Stephen J ^b   O'Neill, Ann E ^b   Waas, Anthony M ^a,c  

^a UNIVERSITY OF MICHIGAN   (United States)

^b FORD MOTOR COMPANY   (United States)

^c ASME   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BIAXIAL STRESS; MULTIAXIAL STRESS STATE; STRESS MAGNITUDES; TEST GEOMETRY;

RAMAN SPECTROSCOPY; STRESS ANALYSIS;

SILICON WAFERS;

EID: 33748430376     PISSN: 00218936     EISSN: None     Source Type: Journal    
DOI: 10.1115/1.2187527     Document Type: Conference Paper

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