메뉴 건너뛰기




Volumn 6, Issue 2, 2006, Pages 186-189

Application of conductive AFM on the electrical characterization of single-bit marginal failure

Author keywords

Conductive atomic force microscopy (AFM); Defect localization; Failure analysis (FA)

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTRIC POTENTIAL; ELECTRIC PROPERTIES; FAILURE ANALYSIS; INTEGRATED CIRCUITS; TRANSISTORS;

EID: 33748098531     PISSN: 15304388     EISSN: 15304388     Source Type: Journal    
DOI: 10.1109/TDMR.2006.877864     Document Type: Conference Paper
Times cited : (6)

References (10)
  • 1
    • 2342476897 scopus 로고    scopus 로고
    • Investigation of sensitivity improvement on passive voltage contrast for defect isolation
    • J. C. Lee and J. H. Chuang, "Investigation of sensitivity improvement on passive voltage contrast for defect isolation," in Proc. ESREF, 2002.
    • (2002) Proc. ESREF
    • Lee, J.C.1    Chuang, J.H.2
  • 2
    • 0033284761 scopus 로고    scopus 로고
    • Identification of processing defects by focused ion beam (FIB) induced voltage contrast
    • C. S. Liu, C.-R. Chen, and Y.-F. Hsieh, "Identification of processing defects by focused ion beam (FIB) induced voltage contrast," in Proc. 7th Int. Phys. Failure Anal., 1999, pp. 129-131.
    • (1999) Proc. 7th Int. Phys. Failure Anal. , pp. 129-131
    • Liu, C.S.1    Chen, C.-R.2    Hsieh, Y.-F.3
  • 3
    • 2342558578 scopus 로고    scopus 로고
    • Junction leakage analysis using scanning capacitance microscopy
    • Mar.
    • A. B. Tarun, J. N. Laniog, J. Tan, and P. Cana, "Junction leakage analysis using scanning capacitance microscopy," IEEE Trans. Device Mater. Rel., vol. 4, no. 1, pp. 46-49, Mar. 2004.
    • (2004) IEEE Trans. Device Mater. Rel. , vol.4 , Issue.1 , pp. 46-49
    • Tarun, A.B.1    Laniog, J.N.2    Tan, J.3    Cana, P.4
  • 4
    • 0012618901 scopus 로고
    • Atomic force microscope
    • Mar.
    • G. Binning, C. F. Quate, and C. Gerber, "Atomic force microscope," Phys. Rev. Lett., vol. 56, no. 9, pp. 930-933, Mar. 1986.
    • (1986) Phys. Rev. Lett. , vol.56 , Issue.9 , pp. 930-933
    • Binning, G.1    Quate, C.F.2    Gerber, C.3
  • 5
    • 0042694329 scopus 로고    scopus 로고
    • A novel application of C_AFM: Deep submicron single probing for IC failure
    • J. C. Lee and J. H. Chuang, "A novel application of C_AFM: Deep submicron single probing for IC failure," Microelectron. Reliab., vol. 43, pp. 687-1692, 2003.
    • (2003) Microelectron. Reliab. , vol.43 , pp. 687-1692
    • Lee, J.C.1    Chuang, J.H.2
  • 6
    • 85124101349 scopus 로고    scopus 로고
    • Fault localization in contact level by using conductive atomic force microscopy
    • _, "Fault localization in contact level by using conductive atomic force microscopy," in Proc. 29th Int. Symp. Testing and Failure Anal., 2003, pp. 414-418.
    • (2003) Proc. 29th Int. Symp. Testing and Failure Anal. , pp. 414-418
  • 8
    • 10444232072 scopus 로고    scopus 로고
    • A novel electrical test by C_AFM to differentiate gate-to-S/D gate oxide short from non-gate oxide short defect in real products
    • C. P. Lin, C. H. Wu, and C. C. Ting, "A novel electrical test by C_AFM to differentiate gate-to-S/D gate oxide short from non-gate oxide short defect in real products," in Proc. 30th Int. Symp. Testing and Failure Anal., 2004, pp. 491-497.
    • (2004) Proc. 30th Int. Symp. Testing and Failure Anal. , pp. 491-497
    • Lin, C.P.1    Wu, C.H.2    Ting, C.C.3
  • 9
    • 10444254019 scopus 로고    scopus 로고
    • Current image atomic force microscopy (CI-AFM) combined with atomic force probing (AFP) for location and characterization of advanced technology node
    • T. Tong and A. N. Erickson, "Current image atomic force microscopy (CI-AFM) combined with atomic force probing (AFP) for location and characterization of advanced technology node," in Proc. 30th Int. Symp. Testing and Failure Anal., 2004, pp. 42-46.
    • (2004) Proc. 30th Int. Symp. Testing and Failure Anal. , pp. 42-46
    • Tong, T.1    Erickson, A.N.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.