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Volumn 43, Issue 9-11, 2003, Pages 1687-1692

A novel application of C-AFM: Deep sub-micron single probing for IC failure analysis

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTAL DEFECTS; FAILURE ANALYSIS; GATES (TRANSISTOR); SEMICONDUCTOR JUNCTIONS; SEMICONDUCTOR MATERIALS; SURFACE TOPOGRAPHY;

EID: 0042694329     PISSN: 00262714     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0026-2714(03)00335-4     Document Type: Conference Paper
Times cited : (11)

References (9)
  • 2
    • 0042467369 scopus 로고    scopus 로고
    • Application of scanning probe microscopy techniques in semiconductor failure analysis
    • B. Ebersberger, A. Olbrich, C. Boit, "Application of scanning probe microscopy techniques in semiconductor failure analysis", ESREF Proceedings, (2001)
    • (2001) ESREF Proceedings
    • Ebersberger, B.1    Olbrich, A.2    Boit, C.3
  • 7
    • 1542330705 scopus 로고    scopus 로고
    • Local electrical thickness mapping of thin oxides with conducting atomic force microscopy
    • A. Olbrich, B. Ebersberger, C. Boit, "Local electrical thickness mapping of thin oxides with conducting atomic force microscopy" ISTFA Proceedingds, (2000)
    • (2000) ISTFA Proceedingds
    • Olbrich, A.1    Ebersberger, B.2    Boit, C.3
  • 8
    • 2342476897 scopus 로고    scopus 로고
    • Investigation of Sensitivity improvement on Passive Voltage Contrast for Defect Isolation
    • Jon C. Lee, J.H. Chuang, "Investigation of Sensitivity improvement on Passive Voltage Contrast for Defect Isolation", ESREF Proceedings, (2002)
    • (2002) ESREF Proceedings
    • Lee, J.C.1    Chuang, J.H.2
  • 9
    • 84895112137 scopus 로고    scopus 로고
    • Digital Instruments, Veeco Metrology Group
    • Application Notes, Digital Instruments, Veeco Metrology Group
    • Application Notes


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.