Photomask lifetime issues in ArF lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5853 PART I, Issue , 2005, Pages 74-82

  Eschbach, Florence ^a   Coon, Peter ^a   Greenebaum, Barbara ^a   Mittal, Anurag ^a   Sanchez, Peter ^a   Tanzil, Daniel ^a   Ng, Grace ^a   Yun, Henry ^a   Sengupta, Archita ^a  

^a INTEL CORPORATION   (United States)

Author keywords

ArF lithography; Pellicle lifetime; Photoinduced defects

Indexed keywords

ARF LITHOGRAPHY; PELLICLE LIFETIME; PHOTOINDUCED EFFECTS; PHOTOMASKS;

ARGON; CRYSTAL DEFECTS; CRYSTAL STRUCTURE; ENVIRONMENTAL IMPACT; IMPURITIES; MASKS;

PHOTOLITHOGRAPHY;

EID: 28544442838     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.617078     Document Type: Conference Paper

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