Effects of soft pellicle frame curvature and mounting process on pellicle-induced distortions in advanced photomasks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5040 II, Issue , 2003, Pages 1044-1054

  Cotte, Eric P ^a   Engelstad, Roxann L ^a   Lovell, Edward G ^a   Tanzil, Daniel ^b   Eschbach, Florence O ^b   Korobko, Yulia ^b   Fujita, Minoru ^c   Nakagawa, Hiroaki ^c  

^a Wisconsin Electric Machines and Power Electronics Consortium   (United States)

^b INTEL CORPORATION   (United States)

^c MITSUI CHEMICALS INC   (Japan)

Author keywords

157 nm lithography; Photomask; Reticle handling; Soft pellicle

Indexed keywords

ADHESIVES; DYNAMIC MECHANICAL ANALYSIS; ELASTIC MODULI; GASKETS; INTEGRATED CIRCUIT MANUFACTURE; MASKS; SENSORS; SILICON WAFERS;

MASK MANUFACTURING; PHOTOMASKS; REGISTRATION MEASUREMENTS; SOFT PELLICLE SYSTEMS;

PHOTOLITHOGRAPHY;

EID: 0141833187     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485474     Document Type: Conference Paper

References (10)

1. Chen, W., Carroll, J., Storm, G., Ivancich, R., Maloney, J., Maurin, O., and Souleillet, E., "Pellicle-Induced Reticle Distortion: An Experimental Investigation," SPIE, Vol. 3546, pp. 167-172, 1998.
2. Röth, K.-D., and Struck, T., "Pellicle-Induced Distortions on Photomasks," SPIE, Vol. 3412, pp. 440-446, 1998.
3. Cotte, E., Engelstad, R., and Lovell, E., "Predicting Pellicle-Induced Distortions for 157 nm Lithography," 2nd International Symposium on 157 nm Lithography, International SEMATECH, 2001.
4. Cotte, E., Engelstad, R., Lovell, Shkel, Y.,E., Eschbach, F., Shu, E., Tanzil, D., and Calhoun, R., "Distortions in Advanced Photomasks from Soft Pellicles," Microelectronic Engineering, Vol. 61-62, pp. 187-192, 2001.
5. Cotte, E., Engelstad, R., Lovell, Shkel, Y., E., Eschbach, F., Shu, E., Tanzil, D., and Calhoun, R, "Numerical and Experimental Studies of Pellicle-Induced Photomask Distortions," Proceedings of the 21st Annual BACUS Symposium on Photomask Technology, Vol. 4562, pp. 641-651, 2001.
6. Cotte, E., Engelstad, R., and Lovell, E. "Experimental and Numerical Studies of Soft Pellicle-Induced Photomask Distortions," Proceedings of the Society for Experimental Mechanics, 2002.
7. Fujita, M., Akiyama, M., Kondo, M., Nakagawa, H., Tanzil, D., Eschbach, F., Cotte, E., Engelstad, R., and Lovell, E., "Pellicle-Induced Distortions in Advanced Photomasks," Proceedings of the 2002 Symposium on Photomask and Next-Generation Lithography Mask Technology IX, Vol. 4754, pp. 588-595, 2002.
8. Cotte, E., Engelstad, R., Lovell, Tanzil, D., Eschbach, F., and Shu, E., "Experimental and Numerical Studies of the Effects of Materials and Attachment Conditions on Pellicle-Induced Distortions in Advanced Photomasks," Proceedings of the 2002 Symposium on Photomask and Next-Generation Lithography Mask Technology IX, Vol. 4754, pp. 578-587, 2002.
9. Shkel, Y., University of Wisconsin, Madison, private communication, 2001.
10. Schlax, M. P., "Experimental Stress Mapping of Film Stacks used in the Fabrication of Lithographic Masks," Ph.D. Thesis, University of Wisconsin, Madison, WI, 2000.