Effect of plasma duct bias on the plasma characteristics of a filtered vacuum arc source

Thin Solid Films

Volumn 444, Issue 1-2, 2003, Pages 23-28

  Kim, Jong Kuk ^a   Kim, Do Geun ^a,c   Byon, Eungsun ^a   Lee, Sunghun ^a   Kim, Kwang Ho ^b   Lee, Gun Hwan ^a  

^a Korea Institute of Machine and Materials   (South Korea)

^b Pusan National University   (South Korea)

^c Samsung SDI   (South Korea)

Author keywords

Amorphous diamond films; Current density; Duct bias; Filtered vacuum arc

Indexed keywords

AMORPHOUS FILMS; DIAMONDS; PLASMAS; VACUUM APPLICATIONS;

VACUUM ARC;

THIN FILMS;

EID: 0142075191     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)00971-4     Document Type: Article

References (22)

1. Lossy R., Pappas D.L., Roy R.A., Doyle J.P., Cuomo J.J., Bruley J. J. Appl. Phys. 77:1995;4750.
2. Boxman R.L., Zhitomirsky V., Alterkop B., Gidalevich E., Beilis I., Keidar M., Goldsmith S. Surf. Coat. Technol. 86/87:1996;243.
3. Mustapha N., Howson R.P. Surf. Coat. Technol. 92:1997;29.
4. Miller H.C. J. Appl. Phys. 52:1981;4523.
5. Aksenov I.I., Vakula S.I., Padalka V.G., Khoroshikh V.M. Sov. Phys. Tech. Phys. 25:1980;1164.
6. Anders A. Surf. Coat. Technol. 120-121:1999;319.
7. V.N. Zhitomirsky, B. Alterkop, U. Kinrot, R. Boxman, S. Goldsmith, in: S. Anders, A. Anders (Eds.), Proceeding of 12th International Symposium on Discharges and Electrical Insulation in Vacuum, Berkeley, USA, July 21-26, 1996, p. 876.
8. S. Falabella, L. Calf, US Patent No. 5468363, November 21, 1995.
9. Kim J.-K., Lee K.-R., Eun K.Y., Chung K.-H. Surf. Coat. Technol. 124:2000;135.
10. Anders A., Anders S., Brown I.G. J. Appl. Phys. 75:1994;4900.
11. Bilek M.M.M., McKenzie D.R., Yin Y., Chhowalla M.U., Milne W.I. IEEE Trans. Plasma Sci. 24:(5):1996;1291.
12. Davis C.A., Donnelly I.J. J. Appl. Phys. 72:(5):1992;1740.
13. Anders A., Anders S., Brown I.G. Plasma Sources Sci. Technol. 4:1995;1.
14. Zhang T., Zhang Y.C., Chu P.K., Brown I.G. Appl. Phys. Lett. 80:(3):2002;365.
15. Halbach K., Holsinger R.F. Part. Accel. 7:1976;213.
16. Zhitomirsky V.N., Boxman R.L., Goldsmith S. J. Vac. Sci. Technol. A. 13:1995;2233.
17. Bilek M.M.M., Yin Y., McKenzie D.R. IEEE Trans. Plasma Sci. 24:(3):1996;1165.
18. Anders A., Fong A., Kulkarni A.V., Ryan F.W., Bhatia C.S. IEEE Trans. Plasma Sci. 29:(5):2001;768.
19. Anders A., Yushkov G.Y. J. Appl. Phys. 91:2002;4824.
20. Tay B.K., Shi X., Cheah L.K., Flynn D.I. Thin Solid Films. 308-309:1997;199.
21. Bilek M.M.M. J. Appl. Phys. 85:(9):1999;6385.
22. Bilek M.M.M., Anders A., Brown I.G. Plasma Sources Sci. Technol. 10:2001;606.