Resist-pattern guided self-assembly of symmetric diblock copolymer

Journal of Photopolymer Science and Technology

Volumn 19, Issue 3, 2006, Pages 385-388

  Yamaguchi, Toru ^a   Yamaguchi, Hiroshi ^a  

^a Kashino Diverse Brain Research Laboratory of NTT Communication Science Laboratories   (Japan)

Author keywords

AFM; Block copolymer; Graphoepitaxy; Self assembly

Indexed keywords

EID: 33747445554     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.19.385     Document Type: Article

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