Fabrication of Nb-doped bismuth titanate thin films using nonionic block copolymer: Enhanced ferroelectric properties

Materials Letters

Volumn 60, Issue 17-18, 2006, Pages 2090-2093

  Kim, Jong Kuk ^a,b   Lee, Ho Sueb ^a,b   Kim, Jinheung ^a,b  

^a Changwon National University   (South Korea)

^b Ewha Womans University   (South Korea)

Author keywords

Bi Ti Nb oxide; Block copolymer; Ferroelectric properties; Metal organic solution deposition; Thin films

Indexed keywords

BISMUTH COMPOUNDS; CALCINATION; COPOLYMERS; DOPING (ADDITIVES); FABRICATION; FERROELECTRICITY; METALLORGANIC CHEMICAL VAPOR DEPOSITION; REMANENCE; SWITCHING;

BISMUTH TITANATE THIN FILMS; METALORGANIC SOLUTION DEPOSITION; NONIONIC BLOCK COPOLYMER;

THIN FILMS;

EID: 33747376903     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matlet.2005.12.081     Document Type: Article

References (31)

1. Scott J.F. Ferroelectric Memories (2000), Springer, Berlin
2. Giridharan N.V., Madeswaran S., and Jayavel R. J. Cryst. Growth 237-239 (2002) 468
3. Sun S., Lu P., and Fuierer P.A. J. Cryst. Growth 205 (1999) 177
4. Li A., Wu D., Ling H., Wang M., Liu Z., and Ming N. J. Cryst. Growth 235 (1999) 394
5. Cummins S.E., and Cross L.E. J. Appl. Phys. 39 (1968) 2268
6. Nagata H., Chikushi N., and Takenaka T. Jpn. J. Appl. Phys. 38 (1999) 5407
7. Kojima T., Sakai T., Watanabe T., Funakubo H., Saito K., and Osada M. Appl. Phys. Lett. 80 (2002) 2746
8. Park B.H., Kang B.S., Bu S.D., Noh T.W., Lee J., and Jo W. Nature 401 (1999) 682
9. Villegas M., Caballero A.C., Moure C., Duran P., and Fernandez J.F. J. Eur. Ceram. Soc. 19 (1999) 1183
10. Wu D., Li A., Zhu T., Liu Z., and Ming N. J. Appl. Phys. 88 (2000) 5941
11. Lee J.-K., Kim C.-H., Suh H.-S., and Hong K.-S. Appl. Phys. Lett. 80 (2002) 3593
12. Shimakawa Y., Kubo Y., Tauchi Y., Asano H., Kamiyama T., Izumi F., and Hiroi Z. Appl. Phys. Lett. 79 (2001) 2791
13. Noguchi Y., and Miyayama M. Appl. Phys. Lett. 78 (2001) 1903
14. Watanabe T., Funakubo H., Osada M., Noguchi Y., and Miyayama M. Appl. Phys. Lett. 80 (2002) 100
15. Chon U., Kim K.-B., Jang H.M., and Yi G.-C. Appl. Phys. Lett. 79 (2001) 3137
16. Kijima T., Ushikubo M., and Matsunaga H. Jpn. J. Appl. Phys. 38 (1999) 127
17. Kim J.K., Kim J., Song T.K., and Kim S.S. Thin Solid Films 419 (2002) 2002
18. Kim S.S., Song T.K., Kim J.K., and Kim J. J. Appl. Phys. 92 (2002) 2213
19. Kim J.K., Song T.K., Kim S.S., and Kim J. Mater. Lett. 57 (2002) 964
20. Yamaguchi M., and Nagatomo T. Jpn. J. Appl. Phys. 37 (1998) 5166
21. Hong S., Trolier-McKinstry S., and Messing G.L. J. Am. Ceram. Soc. 83 (2000) 113
22. Kresge C.T., Leonowicz M.E., Roth W.J., Vartuli J.C., and Beck J.S. Nature 359 (1992) 710
23. Beck J.S., Vartuli J.C., Roth W.J., Leonowicz M.E., Kresge C.T., Schmitt K.D., Chu T.-W., Olson D.H., Sheppard E.W., McCullen S.B., Higgins J.B., and Schlenker J.L. J. Am. Chem. Soc. 114 (1992) 10834
24. Yanagisawa T., Shimizu T., Kuroda K., and Kato C. Bull. Chem. Soc. Jpn. 63 (1990) 988
25. Inagaki S., Fukushima Y., and Kuroda K. Chem. Commun. (1993) 680
26. Grosso D., Balkenende A.R., Albouy P.A., Ayral A., Amenitsch H., and Babonneau F. Chem. Mater. 13 (2001) 1848
27. Tolbert S.H., Schaffer T.E., Feng J., Hansma P.K., and Stucky G.D. Chem. Mater. 9 (1997) 1962
28. Crepaldi E.L., Soler-Illia G.J.d.A.A., Grosso D., Cagnol F., Ribot F., and Sanchez C. J. Am. Chem. Soc. 125 (2003) 9770
29. Yamaguchi M., Nagamoto T., and Omoto O. Thin Solid Films 300 (1997) 299
30. Zhao D., Yang P., Melosh N., Feng J., Chmelka B.F., and Stucky G.D. Adv. Mater. 10 (1998) 1380
31. Kim J.K., Kim S.S., and Kim J. J. Mater. Res. 18 (2003) 2003