Different growth behavior of SrBi2Ta2O9 ferroelectric films under conventional and rapid annealing processing by metalorganic decomposition

Journal of Crystal Growth

Volumn 235, Issue 1-4, 2002, Pages 394-400

  Li, Ai Dong ^a   Wu, Di ^a   Ling, Hui Qin ^a   Wang, Mu ^a   Liu, Zhiguo ^a   Ming, Naiben ^a  

^a NANJING UNIVERSITY   (China)

Author keywords

A1. Crystal morphology; A1. Nucleation; A1. X ray diffraction; A3. Polycrystalline deposition; B1. Oxide; B2. Ferroelectric materials

Indexed keywords

ACTIVATION ENERGY; FILM GROWTH; GRAIN GROWTH; GRAIN SIZE AND SHAPE; NUCLEATION; POLYCRYSTALS; PROBABILITY DISTRIBUTIONS; RAPID THERMAL ANNEALING; STRONTIUM COMPOUNDS; SUBSTRATES;

CONVENTIONAL FURNACE ANNEALING (CFA); METALORGANIC DECOMPOSITION;

FERROELECTRIC THIN FILMS;

EID: 0036467113     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(01)01930-3     Document Type: Article

References (17)

1. Controlled grain growth