Oriented bismuth titanate thin films by single-solid-source metal-organic chemical vapour deposition

Journal of Crystal Growth

Volumn 205, Issue 1, 1999, Pages 177-184

  Sun, Shan ^a   Lu, Ping ^a   Fuierer, Paul A ^a  

^a NEW MEXICO INSTITUTE OF MINING AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL ORIENTATION; DIELECTRIC LOSSES; FERROELECTRIC MATERIALS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PERMITTIVITY; PLATINUM; SILICA; SILICON; THIN FILMS;

BISMUTH TITANATE; TITANIUM METHOXIDE; TRIPHENYLBISMUTH;

BISMUTH COMPOUNDS;

EID: 0032598197     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(99)00261-4     Document Type: Article

References (19)

1. Newnham R.E., Wolf R.W., Dorrian J.F. Mater. Res. Bull. 6:1971;1029.
2. Cummins S.E., Cross L.E. J. Appl. Phys. 39:1968;2268.
3. Sinharoy S., Buhay H., Lampe D.R., Francombe M.H. J. Vac. Sci. Technol. A. 10:1992;1554.
4. Nakamura T., Muhammet R., Shimizu M., Shiosaki T. Jpn. J. Appl. Phys. 32:1993;4086.
5. Wang H., Fu L.W., Shang S.X. J. Appl. Phys. 73:1993;7693.
6. Si J., Desu S.B. J. Appl. Phys. 73:1993;7910.
7. Zhang J., Gardiner R.A., Kirlin P.S., Boerstler R.W., Steinbeck J. Appl. Phys. Lett. 61:1992;2884.
8. Zhao J., Chern C.S., Li Y.Q., Noh D.W., Norris P., Zawadzki P., Kear B., Gallois B. J. Crystal Growth. 107:1991;699.
9. Hiskes R., DiCarolis S.A., Jacowitz R.D., Lu Z., Feigelson R.S., Route R.K., Young J.L. J. Crystal Growth. 108:1993;781.
10. Hiskes R., DiCarolis S.A., Young J.L., Laderman S.S., Jacowitz R.D., Taber R.C. Appl. Phys. Lett. 59:1991;606.
11. P.S. Kirlin, R.L. Binder, R.A. Gardiner, US Patent Application, 07, 807, 807.
12. Rees W.S. Jr. CVD of Nonmetals. 1996;13 VCH, New York.
13. Lu P., Li H., Sun S., Tuttle B.A. J. Crystal Growth. 171:1997;453.
14. Weast R.C., Astle M.J. CRC Handbook of Chemistry and Physics. 61st edition:1980;CRC Press, Boca Raton.
15. P.A. Fuierer, S. Sun, L. Liu, in: E. Pope, S. Sakka, L. Klein (Eds.), Sol-Gel Science and Technology, The Amer. Ceram. Soc., Westerville, OH, 1995, p. 199.
16. Powder Diffraction File #35-0795, JCPDS-ICDD, 1992.
17. Lotgering F.K. J. Inorg. Nucl. Chem. 9:1959;113.
18. Maffei N., Krupanidhi S.B. Appl. Phys. Lett. 60:1992;781.
19. H. Buhay, S. Sinharoy, W. Kasner, M. Francombe, J. Talvacchio, B. Park, N. Doyle, D. Lampe, M. Polinsky, Proceedings of the Third International Symposium on Integrated Ferroelectrics (ISIF), Colorado Springs, Colorado, 1991, p. 62.