The effect of H2SiF6 on the surface morphology of textured multi-crystalline silicon

Semiconductor Science and Technology

Volumn 21, Issue 9, 2006, Pages 1278-1286

  Weinreich, Wenke ^a   Acker, Jörg ^a   Gräber, Iris ^a  

^a IFW DRESDEN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; COMPUTER SIMULATION; CRYSTALLINE MATERIALS; ETCHING; PHOTOVOLTAIC CELLS; SCANNING ELECTRON MICROSCOPY; SILICON COMPOUNDS; SOLAR CELLS; SURFACE ROUGHNESS; SURFACES;

ETCH-TIME EXPERIMENTS; FOCUSED ION BEAM (FIB); OVAL ETCH PITS; SURFACE QUALITY;

SEMICONDUCTING SILICON;

EID: 33747222406     PISSN: 02681242     EISSN: 13616641     Source Type: Journal    
DOI: 10.1088/0268-1242/21/9/012     Document Type: Article

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