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Volumn 80, Issue 2, 2003, Pages 227-237

Texturisation of multicrystalline silicon solar cells by RIE and plasma etching

Author keywords

Multicrystalline; Plasma etching; RIE; Silicon; Texturisation

Indexed keywords

CRYSTALLINE MATERIALS; PLASMA ETCHING; REACTIVE ION ETCHING; SILICON WAFERS;

EID: 0141998785     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solmat.2003.06.003     Document Type: Article
Times cited : (58)

References (11)
  • 3
    • 0031276051 scopus 로고    scopus 로고
    • Surface texturing of large area multicrystalline silicon solar cells using reactive ion etching method
    • Inomata Y., Fukui K., Shirasawa K. Surface texturing of large area multicrystalline silicon solar cells using reactive ion etching method. Sol. Energy Mater. Sol. Cells. 48:1997;237.
    • (1997) Sol. Energy Mater. Sol. Cells , vol.48 , pp. 237
    • Inomata, Y.1    Fukui, K.2    Shirasawa, K.3
  • 6
    • 0037350453 scopus 로고    scopus 로고
    • Texturisation of multicrystalline silicon wafers for solar cells by reactive ion etching through colloidal masks
    • Nositschka W.A., Beneking C., Voigt O., Kurz H. Texturisation of multicrystalline silicon wafers for solar cells by reactive ion etching through colloidal masks. Sol. Energy Mater. Sol. Cells. 76(2):2003;155-166.
    • (2003) Sol. Energy Mater. Sol. Cells , vol.76 , Issue.2 , pp. 155-166
    • Nositschka, W.A.1    Beneking, C.2    Voigt, O.3    Kurz, H.4
  • 9
    • 0141978318 scopus 로고    scopus 로고
    • Dry solar cell processing for low-cost and high-efficiency concepts
    • Vienna
    • R. Lüdemann, S. Schaefer, J. Reiß, Dry solar cell processing for low-cost and high-efficiency concepts, Proceedings of the Second WCPEC, Vienna, 1998, p.1499.
    • (1998) Proceedings of the Second WCPEC , pp. 1499
    • Lüdemann, R.1    Schaefer, S.2    Reiß, J.3
  • 10
    • 0004780106 scopus 로고    scopus 로고
    • Low damage reactive ion etching for photovoltaic applications
    • Schaefer S., Lüdemann R. Low damage reactive ion etching for photovoltaic applications. J. Vac. Sci. Technol. A17:1999;749.
    • (1999) J. Vac. Sci. Technol. , vol.A17 , pp. 749
    • Schaefer, S.1    Lüdemann, R.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.