Influence of microscopic chemical reactions on the preparation of an oxide-free silicon surface in a fluorine-based solution

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 38, Issue 4 B, 1999, Pages 2427-2433

  Sugita, Yoshihiro ^a   Watanabe, Satoru ^a  

^a FUJITSU LABORATORIES LTD   (Japan)

Author keywords

H2SiF6; HF; Hydrogen; Hydrophilic; Hydrophobic; NH4 F; Oxidation; Si; SiO2; TiSi2

Indexed keywords

EID: 0342954361     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.38.2427     Document Type: Article

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