Temperature dependence of the mechanical properties of amorphous carbon films deposited by magnetron sputtering

Powder Metallurgy and Metal Ceramics

Volumn 45, Issue 3-4, 2006, Pages 190-195

  Onoprienko, A A ^a,b   Yanchuk, I B ^a,b  

^a FRANTSEVICH INSTITUTE FOR PROBLEMS OF MATERIALS SCIENCE   (Ukraine)

^b INSTITUTE OF SEMICONDUCTOR PHYSICS   (Ukraine)

Author keywords

Amorphous carbon film; Hardness; Magnetron sputtering; Modulus of elasticity; Raman spectroscopy; Structure

Indexed keywords

ANNEALING; ELASTICITY; ELECTRON DIFFRACTION; GRAPHITE; MAGNETRON SPUTTERING; RAMAN SPECTROSCOPY; THERMAL EFFECTS;

AMORPHOUS CARBON FILMS; ANNEALING TEMPERATURE; INDENTATION METHOD;

AMORPHOUS FILMS;

EID: 33747197728     PISSN: 10681302     EISSN: 15739066     Source Type: Journal    
DOI: 10.1007/s11106-006-0062-5     Document Type: Article

References (21)

1. S. Anders, J. W. Ager III, G. M. Pharr, et al., "Heat treatment of cathodic arc deposited amorphous hard carbon films," Thin Solid Films, 308-309, 186-190 (1997).
2. 2 bonding with deposition temperature in tetrahedral amorphous carbon studied by Raman spectroscopy," Appl. Phys. Lett., 76, No. 11, 1419-1421 (2000).
3. M. A. Capano, N. T. McDevitt, R. K. Singh, and F. Qian, "Characterization of amorphous carbon thin films," J. Vac. Sci. Technol., A 14, No. 2, 431-435 (1996).
4. 2 network structure," Phys. Rev. B, 60, No. 15, 10903-10907 (1999).
5. Y. Lifshitz, G. D. Lempert, S. Rotter, et al., "The influence of substrate temperature during ion beam deposition on the diamond-like or graphitic nature of carbon films," Diamond Relat. Mater., 2, No. 2-4, 285-290 (1993).
6. H. Hofsass, H. Binder, T. Klumpp, and E. Recknagel, "Doping and growth of diamond-like carbon films by ion beam deposition," Diamond Relat. Mater., 3, No. 1-2, 137-142 (1994).
7. 3 fractions approaching diamond," J. Appl. Phys., 70, No. 3, 1706-1711 (1991).
8. E. Mounier, F. Bertin, M. Adamik, et al., "Effect of the substrate temperature on the physical characteristics of amorphous carbon films deposited by d.c. magnetron sputtering," Diamond Relat. Mater., 5, 1509-1515 (1996).
9. J. Fetter, M. Stüber, and S. Ulrich, "Growth effects in carbon coatings deposited by magnetron sputtering," Surf. Coat. Technol., 168, 169-178 (2003).
10. L. R. Shaginyan, A. A. Onoprienko, V. F. Britun, and V. P. Smirnov, "Influence of different physical factors on microstructure and properties of magnetron sputtered amorphous carbon films," Thin Solid Films, 397, 288-295 (2001).
11. 2) nature of carbon films deposited by ion beams," Diamond Relat. Mater., 3, No. 4-6, 542-546 (1994).
12. Ch. Wild and P. Koidl, "Thermal gas effusion from hydrogenated amorphous carbon films," Appl. Phys. Lett., 51, No. 19, 1506-1508 (1987).
13. X. Jiang, W. Beyer, and K. Reichelt, "Gas evolution from hydrogenated amorphous carbon films," J. Appl. Phys., 68, No. 3, 1378-1380 (1990).
14. Y. Bounough, J. Spousta, M. Clin, et al., "Influence of the hydrogen evolution on the structural and electronic properties of a-C : H films," Diamond Relat. Mater., 5, No. 3-5, 453-456 (1996).
15. 3 fractions (ta-C to a-C)," Appl. Phys. Lett., 74, No. 20, 2936-2938 (1999).
16. T. A. Friedman, J. P. Sullivan, J. A. Knapp, et al., "Thick stress-free amorphous-tetrahedral carbon films with hardness near that of diamond," Appl. Phys. Lett., 71, No. 26, 3820-3822 (1997).
17. L. G. Jacobson, R. Priori, F. L. Freire, Jr., et all., "Comparative study of anneal induced modifications of amorphous carbon films deposited by dc magnetron sputtering at different argon plasma pressures," Diamond Relat. Mater., 9, 680-684 (2000).
18. A. A. Onoprienko, V. V. Artamonov, and I. B. Yanchuk, "Effect of deposition and anneal temperature on the resistivity of magnetron sputtered carbon films," Surf. Coat. Tech., 172, 189-193 (2003).
19. A. C. Ferrary and J. Robertson, "Interpretation of Raman spectra of disordered and amorphous carbon," Phys. Rev. B, 61, No. 20, 14095-14107 (2000).
20. S. Bhargava, H. D. Bist, A. V. Narlikar, et al., "Effect of substrate temperature and heat treatment on the microstructure of diamond-like carbon films," J. Appl. Phys., 79, No. 4, 1917-1925 (1996).
21. M. Chhowalla, J. Robertson, C. W. Silva, et al., "Influence of ion energy and substrate temperature on the optical and electronic properties of tetrahedral amorphous carbon (ta-C) films," J. Appl. Phys., 81, No. 1, 139-145 (1997).