Influence of different physical factors on microstructure and properties of magnetron sputtered amorphous carbon films

Thin Solid Films

Volumn 397, Issue 1-2, 2001, Pages 288-295

  Shaginyan, L R ^a   Onoprienko, A A ^a   Britun, V F ^a   Smirnov, V P ^a  

^a FRANTSEVICH INSTITUTE FOR PROBLEMS OF MATERIALS SCIENCE   (Ukraine)

Author keywords

Amorphous materials; Carbon; Ion bombardment; Structural properties

Indexed keywords

CARBON; CRYSTAL MICROSTRUCTURE; ELECTRON DIFFRACTION; FILM GROWTH; GRAPHITE; ION BOMBARDMENT; MAGNETRON SPUTTERING; RAMAN SPECTROSCOPY; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SPUTTER DEPOSITION; TEXTURES; TRANSMISSION ELECTRON MICROSCOPY;

CLUSTER STRUCTURES;

AMORPHOUS FILMS;

EID: 0035500208     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(01)01423-7     Document Type: Article

References (24)