Development and characterization of silane antisticking layers on nickelbased stamps designed for nanoimprint lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 23, Issue 2, 2005, Pages 575-584

  Keil, M ^a   Beck, M ^b   Ling, T G I ^b   Graczyk, M ^b   Montelius, L ^b   Heidari, B ^a  

^a Box 580   (Sweden)

^b LUND UNIVERSITY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; DEPOSITION; LITHOGRAPHY; OXIDATION; SURFACES; X RAY PHOTOELECTRON SPECTROSCOPY;

NANOIMPRINT LITHOGRAPHY; NICKEL-BASED STAMPS;

SILANES;

EID: 31144450489     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1880292     Document Type: Conference Paper

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