Square and triangular nanohole array architectures in anodic alumina

Advanced Materials

Volumn 13, Issue 3, 2001, Pages 189-192

  Masuda, Hideki ^a   Asoh, Hidetaka ^a   Watanabe, Mitsuo ^a   Nishio, Kazuyuki ^a   Nakao, Masashi ^b   Tamamura, Toshiaki ^c  

^a TOKYO METROPOLITAN UNIVERSITY   (Japan)

^b NTT CORPORATION   (Japan)

^c NTT Corporation and CREST of Japan Science and Technology   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; CRYSTAL LATTICES; GRAPHITE; MOLECULAR STRUCTURE; POROUS MATERIALS;

ANODIC POROUS ALUMINA;

ALUMINA;

EID: 0034825623     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: 10.1002/1521-4095(200102)13:3<189::AID-ADMA189>3.0.CO;2-Z     Document Type: Article

References (24)

1. T. M. Whitney, J. S. Jiang, P. C. Searson, C. L. Chien, Science 1993, 261, 1316.
2. R. J. Tonucci, B. L. Justus, A. J. Campillo, C. E. Ford, Science 1992, 258, 783.
3. C. G. Granqvist, A. Andersson, O. Hundri, Appl. Phys. Lett. 1979, 35, 268.
4. C. A. Huber, T. E. Huber, M. Sadoqi, J. A. Lubin, S. Manalis, C. B. Prater, Science 1994, 263, 800.
5. C. R. Martin, Science 1994, 266, 1961.
6. C. K. Preston, M. Moskovits, J. Phys. Chem. 1993, 97, 8495.
7. G. Schmid, M. Baumle, M. Geerkens, I. Heim, C. Osemann, T. Sawitowski, Chem. Soc. Rev. 1999, 28, 179.
8. G. Voronoi, Z. Reine, Angew. Math. 1908, 134, 198.
9. J. Broughton, G. A. Davies, J. Membrane Science 1995, 106, 89.
10. F. Keller, M. S. Hunter, D. L. Robinson, J. Electrochem. Soc. 1953, 100, 411.
11. J. P. O'Sullivan, G. C. Wood, Proc. R. Soc. London 1970, A317, 511.
12. H. Masuda, K. Fukuda, Science 1995, 268, 1466.
13. H. Masuda, F. Hasegawa, S. Ono, J. Electrochem. Soc. 1997, 144, L127.
14. H. Masuda, K. Yada, A. Osaka, Jpn. J. Appl. Phys. 1998, 37, L1340.
15. F. Li, L. Zhang, R. M. Metzger, Chem. Mater. 1998, 10, 2470.
16. O. Jessensky, F. Muller, U. Gösele, Appl. Phys. Lett. 1998, 72, 1173.
17. H. Masuda, H. Yamada, M. Satoh, H. Asoh, M. Nakao, T. Tamamura, Appl. Phys. Lett. 1997, 71, 2770.
18. K. Ebihara, H. Takahashi, M. Nagayama, J. Met. Finishing Soc. Jpn. 1983, 34, 548.
19. G. E. Thompson, R. C. Furneaux, G. C. Wood, Corrosion Sci. 1978, 18, 481.
20. 7 at 65 V for 10 s at 20°C. This process yields nonporous oxide layer on Al, the thickness of which was estimated to be 90 nm from the applied voltage.
21. J. D. Joannopoulos, R. D. Meade, J. N. Winn, Photonic Crystals, Princeton Univ. Press, Princeton 1995.
22. F. Gadot, Appl. Phys. Lett. 1997, 71, 1780.
23. T. Kyotani, L.-F. Tasi, A. Tomita, Chem. Mater. 1996, 8, 2109.
24. G. Che, B. Lakshin, E. Fisher, C. R. Martin, Nature 1998, 393, 346.