Fabrication of monodomain alumina pore arrays with an interpore distance smaller than the lattice constant of the imprint stamp

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 2, 2003, Pages 763-766

  Choi, J ^a   Nielsch, K ^a   Reiche, M ^a   Wehrspohn, R B ^a   Gosele U ^a  

^a MAX PLANCK INSTITUTE OF MICROSTRUCTURE PHYSICS   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ANODIC OXIDATION; LATTICE CONSTANTS; LITHOGRAPHY; POROSITY; POROUS MATERIALS; SILICON;

IMPRINT LITHOGRAPHY;

ALUMINA;

EID: 0037276703     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1556397     Document Type: Article

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