Suppression of phosphorus diffusion by carbon co-implantation

Applied Physics Letters

Volumn 89, Issue 6, 2006, Pages

  Pawlak, B J ^a   Duffy, R ^a   Janssens, T ^b   Vandervorst, W ^b   Felch, S B ^c   Collart, E J H ^d   Cowern, N E B ^e  

^a PHILIPS RESEARCH LABORATORIES   (Netherlands)

^b IMEC   (Belgium)

^c APPLIED MATERIALS INC   (United States)

^d Applied Implant Technologies   (United Kingdom)

^e UNIVERSITY OF SURREY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

CO-IMPLANTATION; FLUX SUPPRESSION; GATE LENGTHS; RAPID THERMAL ANNEALING (RTA);

AMORPHIZATION; DIFFUSION; GATES (TRANSISTOR); ION IMPLANTATION; OPTIMIZATION; PHOSPHORUS COMPOUNDS; RAPID THERMAL ANNEALING;

CARBON;

EID: 33747098214     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2234315     Document Type: Article

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