TaSiN diffusion barriers deposited by reactive magnetron sputtering

Thin Solid Films

Volumn 513, Issue 1-2, 2006, Pages 118-124

  Letendu, F ^a   Hugon, M C ^a   Agius, B ^a   Vickridge, I ^b   Berthier, C ^c   Lameille, J M ^c  

^a UNIVERSITÉ PARIS SUD   (France)

^b SORBONNE UNIVERSITÉ   (France)

^c CEA SACLAY   (France)

Author keywords

18O; Diffusion barrier; Oxidation resistance; TaSiN

Indexed keywords

ANNEALING; DEPOSITION; DIFFUSION; MAGNETRON SPUTTERING; OXIDATION; OXIDATION RESISTANCE; PERMITTIVITY; THIN FILMS;

DEPOSITION PARAMETERS; DIFFUSION BARRIER; TASIN;

TANTALUM;

EID: 33746943269     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.01.076     Document Type: Article

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