Characterization and oxidation kinetics of reactively sputtered T1-xAlxN film

Materials Research Society Symposium - Proceedings

Volumn 541, Issue , 1999, Pages 191-196

  Ishizuka, Yoshiki ^a   Kim, Dong Joo ^a   Streiffer, Stephen K ^b   Kingon, Angus I ^a  

^a North Carolina State University   (United States)

^b ARGONNE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; ANNEALING; AUGER ELECTRON SPECTROSCOPY; CURRENT DENSITY; ELECTRIC POTENTIAL; ELECTRIC PROPERTIES; ELECTRIC RESISTANCE; OXIDATION; REACTION KINETICS; SPUTTER DEPOSITION; TITANIUM COMPOUNDS;

DEPTH PROFILE ANALYSIS; OXIDATION KINETICS;

CONDUCTIVE FILMS;

EID: 0032592423     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (8)

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