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Volumn 16, Issue 9, 2001, Pages 2591-2599

18O study of the oxidation of reactively sputtered Ti1-xAlxN barrier

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0442307912     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.2001.0356     Document Type: Article
Times cited : (8)

References (24)
  • 15
    • 0032592423 scopus 로고    scopus 로고
    • Ferroelectric Thin Films VII, edited by R.E. Jones, R.W. Schwartz, S.R. Summerfelt, and I.K. Yoo Warrendale, PA
    • Y. Ishizuka, D.J. Kim, S.K. Streiffer, and A. Kingon, in Ferroelectric Thin Films VII, edited by R.E. Jones, R.W. Schwartz, S.R. Summerfelt, and I.K. Yoo (Mater. Res. Soc. Symp. Proc. 541, Warrendale, PA, 1999), p. 191.
    • (1999) Mater. Res. Soc. Symp. Proc. , vol.541 , pp. 191
    • Ishizuka, Y.1    Kim, D.J.2    Streiffer, S.K.3    Kingon, A.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.