Shadow effect and its revisal in grid-enhanced plasma source with ion implantation method

Chinese Physics Letters

Volumn 21, Issue 6, 2004, Pages 1114-1116

  Zhang, Gu Ling ^a   Wang, Jiu Li ^a   Liu, Yuan Fu ^a   Li, Xue Ming ^b   Wu, Xing Fang ^b   Fan, Song Hua ^a   Liu, Chi Zi ^a   Yang, Si Ze ^a  

^a INSTITUTE OF PHYSICS   (China)

^b UNIVERSITY OF SCIENCE AND TECHNOLOGY BEIJING   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ION IMPLANTATION; ION SOURCES; PLASMA SOURCES; PRESSURE EFFECTS;

ELECTRODE RADII; GAS PRESSURES; GRID ELECTRODES; GRID-ENHANCED PLASMA SOURCE ION IMPLANTATIONS; HIGH GAS PRESSURES; ION IMPLANTATION METHODS; KEYS PARAMETERS; SAMPLE SURFACE; SHADOW EFFECTS; SURFACE GRIDS;

PLASMA DENSITY;

EID: 9544253889     PISSN: 0256307X     EISSN: None     Source Type: Journal    
DOI: 10.1088/0256-307X/21/6/038     Document Type: Article

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