Tailoring of the morphology and chemical composition of thin organosilane microwave plasma polymer layers on metal substrates

Thin Solid Films

Volumn 446, Issue 1, 2004, Pages 61-71

  Grundmeier, G ^a   Thiemann, P ^a   Carpentier, J ^a   Shirtcliffe, N ^a   Stratmann, M ^a  

^a MAX PLANCK INSTITUT FÜR EISENFORSCHUNG GMBH   (Germany)

Author keywords

Atomic force microscopy; Interfaces; Plasma processing and deposition; Surface morphology

Indexed keywords

ABSORPTION SPECTROSCOPY; ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; COMPOSITION; CORROSION PROTECTION; FILM GROWTH; INFRARED SPECTROSCOPY; MICROWAVE SPECTROSCOPY; MORPHOLOGY; PARTIAL PRESSURE; SECONDARY ION MASS SPECTROMETRY; SILANES; STRUCTURE (COMPOSITION); SURFACE ROUGHNESS; SURFACE TOPOGRAPHY; X RAY PHOTOELECTRON SPECTROSCOPY;

PLASMA DEPOSITION; PLASMA POLYMERS; PLASMA PROCESSING; SELF-CLEANING SURFACES; ULTRA-HYDROPHOBIC FILMS;

THIN FILMS;

EID: 0348252344     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2003.09.043     Document Type: Article

References (25)

1. Morosoff N. d'Agostino R. Plasma Deposition, Treatment and Etching of Polymers. 1990;68-84 Academic Press, Boston. Chapter 1.
2. Wang T.F., Lin T.J., Yang D.J., Antonelli J.A., Yasuda H.K. Prog. Org. Coat. 28:1996;291.
3. Van Ooij W.J., Sabata A., Zeik D.B., Taylor C.E., Boerio F.J., Clarson S.J. J. Test. Eval. 23:(1):1995;33.
4. Yasuda H., Wang T.F., Cho D.L., Lin T.J., Antonelli J.A. Prog. Org. Coat. 30:1997;31.
5. Lin T.J., Antonelli J.F., Yang D.J., Yasuda H.K., Wang F.T. Prog. Org. Coat. 31:1997;351.
6. Bottin M., Schreiber H.P., Klemberg-Sapieha J.E., Wertheimer J.M.R. J. Appl. Polym. Sci. 38:1984;192.
7. Wróbel A.M., Wertheimer M.R. dAgostino R. Plasma Deposition, Treatment and Etching of Polymers. 1990;163-268 Academic Press, Boston. Chapter 3.
8. Elkin B., Mayer J., Schindler B., Vohrer U. Surf. Coat. Technol. 116-119:1999;836.
9. Hozumi A., Takai O. Thin Solid Films. 303:1997;222.
10. Shirtcliffe N., Thiemann P., Stratmann M., Grundmeier G. Surf. Coat. Technol. 142-144:2001;1121.
11. Smith D.L. Thin Film Deposition. 1995;McGraw-Hill, NY.
12. Messier R., Giri A.P., Roy R.A. J. Vac. Sci. Technol. A. 2:1984;500.
13. Wróbel A.M., Walkiewicz-Pietrzykowska A., Klemberg-Sapieha J.E., Hatanaka Y., Aoki T., Nakanishi Y. J. Appl. Polym. Sci. 86:2002;1445.
14. Bertrand N., Drévillon B., Bulkin P. J. Vac. Sci. Technol. A. 16:(1):1998;63.
15. Taylor C.E., Boerio F.J. J. Adhes. 69:1999;217.
16. Niikura C., Kim S., Drévillon B., Poissant Y., Roca i Cabarrocas P., Bourée J. Thin Solid Films. 395:2001;178.
17. Pereyra I., Alayo M.I. J. Non-Cryst. Solids. 212:1997;225.
18. Borghesi A., Sassela A., Pivac B., Zanotti L. Solid State Commun. 100:(9):1996;657.
19. Van Ooij W.J., Sabata A. J. Adhes. Sci. Technol. 5:(10):1991;843.
20. Wróbel A.M., Czeremuszkin G. Thin Solid Films. 216:1992;203.
21. Wenzel R.N. J. Phys. Colloid Chem. 53:1949;1466.
22. Cassie A.B.D. Discuss. Faraday Soc. 3:1948;11.
23. Kijlstra J., Reihs K., Klamt A. Colloid. Surf. A. 206:2002;521.
24. Vallée C., Granier A., Aumaille K., Cardinaud C., Goullet A., Coulon N., Turban G. Appl. Surf. Sci. 138-139:1999;57.
25. Harbecke B., Heinz B., Grosse P. Appl. Phys. A. 38:1985;263.