Mass density determination of thin organosilicon films by X-ray reflectometry

Applied Surface Science

Volumn 173, Issue 1-2, 2001, Pages 115-121

  Van Der Lee, A ^a   Roualdes, S ^a   Berjoan, R ^b   Durand, J ^a  

^a UNIVERSITÉ DE MONTPELLIER   (France)

^b Centre National de la Recherche Scientifique   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; LIGHT REFLECTION; SILICON; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

MASS DENSITY;

SURFACE TREATMENT;

EID: 0034817903     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(00)00890-4     Document Type: Article

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