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Journal of Materials Science: Materials in Electronics

Volumn 17, Issue 8, 2006, Pages 615-620

Characterization of CuAlO2 films prepared by dc reactive magnetron sputtering

(4) Reddy, A Sivasankar a Reddy, P Sreedhara a Uthanna, S a Rao, G Mohan b

a SRI VENKATESWARA UNIVERSITY (India)

b INDIAN INSTITUTE OF SCIENCE (India)

Author keywords

[No Author keywords available]

Indexed keywords

CHARACTERIZATION; ELECTRIC CONDUCTIVITY; MAGNETRON SPUTTERING; OPTICAL PROPERTIES; POLYCRYSTALLINE MATERIALS; THIN FILMS;

COPPER ALUMINUM OXIDE; GLASS SUBSTRATES; OXYGEN PARTIAL PRESSURES;

COPPER COMPOUNDS;

EID: 33746325179 PISSN: 09574522 EISSN: 1573482X Source Type: Journal
DOI: 10.1007/s10854-006-0007-2 Document Type: Article

Times cited : (35)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.