Delafossite CuAlO2 films prepared by reactive sputtering using Cu and Al targets

Journal of Physics and Chemistry of Solids

Volumn 64, Issue 9-10, 2003, Pages 1671-1674

  Tsuboi, N ^a   Takahashi, Y ^a   Kobayashi, S ^a   Shimizu, H ^a   Kato, K ^a   Kaneko, F ^a  

^a NIIGATA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; DEPOSITION; LIGHT ABSORPTION; METALLIC FILMS; SPUTTERING; STOICHIOMETRY; SYNTHESIS (CHEMICAL);

SOLID STATE REACTION;

COPPER COMPOUNDS;

EID: 0042737952     PISSN: 00223697     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3697(03)00194-X     Document Type: Conference Paper

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