Interdiffusion in direct ion beam deposited isotopic Fe/Si trilayers

Journal of Applied Physics

Volumn 89, Issue 11 II, 2001, Pages 7074-7076

  Telling, N D ^a   Faunce, C A ^a   Bonder, M J ^a   Grundy, P J ^a   Lord, D G ^a   Van Den Berg, J A ^a   Langridge, S ^b  

^a UNIVERSITY OF SALFORD   (United Kingdom)

^b RUTHERFORD APPLETON LABORATORY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035356065     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1357151     Document Type: Article

References (9)

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